Design for Manufacturability with Advanced Lithography

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Synopsis

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

Book details

Edition:
1st ed. 2016
Author:
Bei Yu, David Z. Pan
ISBN:
9783319203850
Related ISBNs:
9783319203843
Publisher:
Springer International Publishing
Pages:
N/A
Reading age:
Not specified
Includes images:
Yes
Date of addition:
2019-09-09
Usage restrictions:
Copyright
Copyright date:
2016
Copyright by:
Springer International Publishing, Cham 
Adult content:
No
Language:
English
Categories:
Computers and Internet, Nonfiction, Technology