Spacer Engineered FinFET Architectures High-Performance Digital Circuit Applications

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Synopsis

This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.

Book details

Author:
Sudeb Dasgupta, Brajesh Kumar Kaushik, Pankaj Kumar Pal
ISBN:
9781351751032
Related ISBNs:
9781315191089, 9780367573553, 9781498783590
Publisher:
CRC Press
Pages:
138
Reading age:
Not specified
Includes images:
Yes
Date of addition:
2023-10-01
Usage restrictions:
Copyright
Copyright date:
2017
Copyright by:
Taylor & Francis Group, LLC 
Adult content:
No
Language:
English
Categories:
Nonfiction, Technology